Standard characterization
Characterization of LGM’s cluster source (deposition rate, radial dependance of cluster size) and characterization of cluster-assembled nanostructured materials herein produced (surface morphology, film thickness, electrical and tribological properties). Nanostructured films of different materials (C, Ti, Pd,MoS2...) can be deposited onto glass, plastic, silicon, and other substrates by means of SCBD. AFM provides usefull information, complementary to other characterization techniques (SEM, Raman, TEM, XPS, etc), to control and tailor the phisico-chemical and mechanical properties of coatings.
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(3D image 50x25µm) |